Dr. Gomathi and Mr. Shashank Rao from IIST have been granted patent for “Atmospheric Pressure Nitrogen Plasma Treated Metal-Organic Frameworks for Carbon Dioxide Capture”. Inventors have developed a novel plasma surface modification technique for metal-organic frameworks (MOFs) that significantly enhancescarbon dioxide capture. This fast,   eco-friendly process avoids harsh chemicals and marks a sustainable carbon capture. The innovation offers a greener alternative to conventional methods and holds promise for critical environmental and space applications.

• Patent No.: 567565
• Application No.: 202441081038
• Date of Filing: 18/10/2024
• Date of Grant: 18/06/2025
• Title: Atmospheric Pressure Nitrogen Plasma
• Treated Metal-Organic Frameworks for Carbon
• Dioxide Capture